Carbon nitride Chemical detection Titanium dioxide Plasmas froids Chemical and biological sensors Anatase Alloying A3 Physical vapor deposition processes Bipolar resistive switching BRS Buffer Couple Calcined clay CH4 Biomasse TiO2 Band alignment Films Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation B2 Semiconducting alloys Thin films TEM A Thin films CIGSe Etching SF 6 Ablation laser Thin film Optical properties B3 Solar cells Chalcogenides A1 Characterization Semiconductors Functionalization Carbon nanotubes Magnetron sputtering Scanning electron microscopy Aluminium nitride Copper Transmission electron microscopy 3 nm in size V2O3 A Chalcogenides AlN CaTiO3Pr^3^+ Transfert d'énergie Oxides A Multilayers Carbon Adsorption Amorphous Alzheimer's disease Band gap CHLORINE PLASMAS AZO thin films Carbon Nanotube Chalcogenide glass B2 Semiconducting indium compounds B Chemical synthesis XPS Colloidal solution Cathepsin Nanocomposite Chalcogenide Vanadium Sesquioxide Mott insulator Structure Selenization Residual stress X-ray photoelectron spectroscopy B2 Quaternary Plasma etching Biocapteurs Ambipolar material Low-pressure plasma processing Sol-gel Atomic layer etching Resistive switching Physical vapor deposition Sputtering Aryl-diazonium salts NEXAFS Mott insulators Non-volatile memory Amyloid precursor Spectroscopic ellipsometry Applications industrielles X-ray diffraction C Photoelectron spectroscopy PECVD B1 Inorganic compounds BOMBARDMENT Biofilms microbiens A-CNx AuCu alloy Nanotubes Capacitance Atomic force microscopy Avalanche breakdown Kirkendall effect Bixbyite CNTs’ collapse