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Effets de la fréquence d'excitation sur l'uniformité du plasma dans les réacteurs capacitifs grande surface.

Abstract : Low-pressure capacitive discharges are routinely used in the flat panel industry for deposition of thin films on large-area substrates. Deposition rates may also be increased by increasing the excitation frequency, typically from 13.56 MHz, up to 120 MHz (Very High Frequency), which provides higher-density plasmas with low-energy ions. However, strong non-uniformities of plasma production are expected in capacitive discharges if the excitation wavelength becomes comparable to the reactor size (standing-wave effect). Ion flux and ion energy uniformity measurements were carried out in a large-area square capacitive discharge driven at frequencies between 13.56 MHz and 81.36 MHz in argon gas up to 200 mTorr. At high frequency, the ion flux is non-uniform due to the standing wave effect. Ion energy is uniform in the same conditions. The influence of gaz pressure and composition is also investigated.
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https://pastel.archives-ouvertes.fr/pastel-00000837
Contributor : Ecole Polytechnique <>
Submitted on : Wednesday, July 21, 2010 - 3:03:34 PM
Last modification on : Saturday, March 30, 2019 - 2:29:27 AM
Long-term archiving on: : Friday, October 22, 2010 - 3:11:14 PM

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  • HAL Id : pastel-00000837, version 1

Citation

Amélie Hacala-Perret. Effets de la fréquence d'excitation sur l'uniformité du plasma dans les réacteurs capacitifs grande surface.. Physique des plasmas [physics.plasm-ph]. Ecole Polytechnique X, 2004. Français. ⟨pastel-00000837⟩

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