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The deposition of multilayer and gradient index thin films by Matrix Distributed Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition MDECR-PECVD.

Abstract : This work is devoted to the study of the deposition of optical thin films and to the control of this process. Initially, the task was to develop a robust ellipsometric control technique for gradient refractive index layers. During the course of the work, it has evolved towards the broader area of ECR PECVD research and multilayer optical filter ellipsometry control. Despite the fact that HDP-PECVD is used routinely in microelectronic fabrication, many questions about this technique are still unanswered. We have investigated aspects of this technique with the aim of gaining new insights on the physical processes involved. In the thesis, the following parts of the work will be discussed, in order to present a coherent view of the subject: 1. Optical thin films, plasmas and plasma deposition technology. 2. ECR-PECVD features and development. 3. The MDECR deposition system Venus and the characterization of deposition plasmas. 4. Deposition of optical filters based on silicon oxynitride alloys, and several characterization techniques such as spectroscopic ellipsometry. 5. Kinetic ellipsometry and ellipsometric control of optical thin films. 6. Conclusion and recommendations for future work. These points represent the structure of this document. They will be detailed in the next sections and expanded upon in the following chapters.
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Bicher Haj Ibrahim. The deposition of multilayer and gradient index thin films by Matrix Distributed Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition MDECR-PECVD.. Physics [physics]. Ecole Polytechnique X, 2007. English. ⟨pastel-00002930⟩

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