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Excitation multifréquence dans les décharges capacitives utilisées pour la gravure en micro-électronique.

Abstract : This thesis deals with the multiple-frequency excitation of low pressure capacitive discharges used for etching in microelectronics. The principal interest of a capacitive discharge excited at two frequencies is that it allows independent control over ion energy on the one hand and ion flux on the other. In the first part, I develop an analytical global model based on (i) inhomogeneous, capacitive space charge sheath model, excited at two frequencies, (ii) electron-heating model in these sheaths (ohmic and stochastic). Results show that heating causes coupling in the sheath of the low frequency component and the high frequency component. Consequently, ion flux and ion energy are not independent. This has been verified by obtaining scaling laws for ion energy and ion flux. At high frequency, it may be possible to see the discharge as the propagation of surface waves from the centre of the discharge to the periphery between the plasma and the sheath. When the wavelength in the plasma λ, associated with the highest frequency is of the order of the electrode size, electromagnetic effects appear. They have been labeled the standing wave effect (λ
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Contributor : Ecole Polytechnique <>
Submitted on : Friday, July 23, 2010 - 9:43:03 AM
Last modification on : Saturday, March 30, 2019 - 2:29:32 AM
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  • HAL Id : pastel-00003567, version 1


Pierre Levif. Excitation multifréquence dans les décharges capacitives utilisées pour la gravure en micro-électronique.. Physique des plasmas [physics.plasm-ph]. Ecole Polytechnique X, 2007. Français. ⟨pastel-00003567⟩



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