P. Wagner, S. Nock, J. A. Spudich, W. D. Volkmuth, S. Chu et al., Bioreactive Self-Assembled Monolayers on Hydrogen-Passivated Si(111) as a New Class of Atomically Flat Substrates for Biological Scanning Probe Microscopy, Journal of Structural Biology, vol.119, issue.2, pp.189-201, 1997.
DOI : 10.1006/jsbi.1997.3881

J. M. Buriak, Organometallic Chemistry on Silicon and Germanium Surfaces, Chemical Reviews, vol.102, issue.5, pp.1271-1308, 2002.
DOI : 10.1021/cr000064s

D. D. Wayner and R. A. Wolkow, Organic modification of hydrogen terminated silicon surfaces, Journal of the Chemical Society-Perkin Transactions, issue.2, pp.23-34, 2002.

R. Boukherroub, Chemical reactivity of hydrogen-terminated crystalline silicon surfaces, Current Opinion in Solid State and Materials Science, vol.9, issue.1-2, pp.66-72, 2005.
DOI : 10.1016/j.cossms.2006.03.006

W. Cai, J. R. Peck, D. W. Van-der-weide, and R. J. Hamers, Direct electrical detection of hybridization at DNA-modified silicon surfaces, Biosensors and Bioelectronics, vol.19, issue.9, pp.1013-1019, 2004.
DOI : 10.1016/j.bios.2003.09.009

M. L. Munford, R. Cortès, A. , and P. , The Preparation of Ideally Ordered Flat H-Si(111) Surfaces. Sensors and materials, pp.259-269, 2001.

B. R. Weinberger, G. G. Peterson, T. C. Eschrich, and H. A. Krasinski, Surface chemistry of HF passivated silicon: X???ray photoelectron and ion scattering spectroscopy results, Journal of Applied Physics, vol.60, issue.9, pp.60-3232, 1986.
DOI : 10.1063/1.337743

E. Yablonovitch, D. L. Allara, C. C. Chang, T. Gmitter, and T. B. Bright, Unusually Low Surface-Recombination Velocity on Silicon and Germanium Surfaces, Physical Review Letters, vol.57, issue.2, pp.249-252, 1986.
DOI : 10.1103/PhysRevLett.57.249

N. J. Harrick, K. H. Beckmann, P. F. Par, G. R. Kane, A. Larrabee et al., Characterization of Solid Surfaces, éd In situ chemical information at the semiconductor/electrolyte interface from infrared vibrational spectroscopy, Applied Physics Letters, issue.3, pp.47-334, 1974.

Y. J. Chabal, Surface infrared spectroscopy, Surface Science Reports, vol.8, issue.5-7, pp.211-357, 1988.
DOI : 10.1016/0167-5729(88)90011-8

Y. J. Chabal, G. S. Higashi, K. Raghavachari, V. A. Burrows, H. Ubara et al., Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Formation of Si-H bonds on the surface of microcrystalline silicon covered with SiOx by HF treatment Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation, Solid State Communications Physical Review Letters, vol.7, issue.654, pp.2104-2109, 1984.

G. S. Higashi, Y. J. Chabal, G. W. Trucks, R. , and K. , Ideal hydrogen termination of the Si (111) surface Applied Physics Letters, Dependence of the surface structure and the hydrogen termination on the pH of the etching solutions, pp.656-658, 1990.

P. Jakob, Y. J. Chabal, K. Raghavachari, R. S. Becker, and A. J. Becker, Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions, Surface Science, vol.275, issue.3, pp.275-407, 1992.
DOI : 10.1016/0039-6028(92)90813-L

K. Raghavachari, P. Jakob, and Y. J. Chabal, Step relaxation and surface stress at Hterminated vicinal Si(111) Chemical Physics Letters, pp.1-4, 1993.
DOI : 10.1016/0009-2614(93)85533-t

P. Jakob, Y. J. Chabal, K. Kuhnke, and S. B. Christman, Monohydride structures on chemically prepared silicon surfaces, Surface Science, vol.302, issue.1-2, pp.49-56, 1994.
DOI : 10.1016/0039-6028(94)91095-2

P. Allongue, V. Kieling, and H. Gerischer, Etching mechanism and atomic structure of H-Si(111) surfaces prepared in NH 4 F, Electrochimica Acta, issue.10, pp.40-1353, 1995.

P. Allongue, C. Henry-de-villeneuve, S. Morin, R. Boukherroub, and D. D. Wayner, The preparation of flat H-Si(111) surfaces in 40% NH 4 F revisited, Electrochimica Acta, issue.28, pp.45-4591, 2000.

Y. Huang, J. Flidr, T. A. Newton, and M. A. Hines, Dynamic repulsion of surface steps during step flow etching: Controlling surface roughness with chemistry, The Journal of Chemical Physics, vol.109, issue.12, pp.109-5025, 1998.
DOI : 10.1063/1.477115

J. Flidr, Y. Huang, T. A. Newton, and M. A. Hines, Extracting site-specific reaction rates from steady state surface morphologies: Kinetic Monte Carlo simulations of aqueous Si(111) etching, The Journal of Chemical Physics, vol.108, issue.13, pp.108-5542, 1998.
DOI : 10.1063/1.475944

J. Flidr, Y. Huang, and M. A. Hines, An atomistic mechanism for the production of two- and three-dimensional etch hillocks on Si(111) surfaces, The Journal of Chemical Physics, vol.111, issue.15, pp.111-6970, 1999.
DOI : 10.1063/1.479990

J. Kasparian, M. Elwenspoek, A. , and P. , Digital computation and in situ STM approach of silicon anisotropic etching, Surface Science, vol.388, issue.1-3, pp.1-3, 1997.
DOI : 10.1016/S0039-6028(97)00356-7

C. P. Wade and C. E. Chidsey, Etch-pit initiation by dissolved oxygen on terraces of H-Si(111) Applied Physics Letters, pp.71-1679, 1997.

H. Fukidome and M. Matsumura, Electrochemical study of atomically flattening process of silicon surface in 40% NH4F solution, Applied Surface Science, vol.130, issue.132, pp.130-132, 1998.
DOI : 10.1016/S0169-4332(98)00041-5

V. Y. Timoshenko, J. Rappich, and T. Dittrich, Express characterization of indirect semiconductor surfaces by in situ photoluminescence during chemical and electrochemical treatments, Applied Surface Science, vol.123, issue.124, pp.123-124, 1998.
DOI : 10.1016/S0169-4332(97)00471-6

V. Y. Timoshenko, A. B. Petrenko, T. Dittrich, W. Fussel, R. et al., Photoluminescence characterization of non-radiative defect density on silicon surfaces and interfaces at room temperature. Thin Solid Films Non-radiative recombination at reconstructed Si surfaces. Solid-State Electronics, pp.46-1863, 2000.

S. Fellah, A. Teyssot, F. Ozanam, J. Chazalviel, J. Vigneron et al., Kinetics of Electrochemical Derivatization of the Silicon Surface by Grignards, Langmuir, vol.18, issue.15, pp.18-5851, 2002.
DOI : 10.1021/la0203739

V. Y. Timoshenko, A. B. Petrenko, M. N. Stolyarov, T. Dittrich, W. Fuessel et al., Quantitative analysis of room temperature photoluminescence of c-Si wafers excited by short laser pulses, Journal of Applied Physics, vol.85, issue.8, pp.85-4171, 1999.
DOI : 10.1063/1.370327

M. J. Madou, B. H. Loo, K. W. Frese, and S. R. Morrison, Bulk and surface characterization of the silicon electrode, Surface Science, vol.108, issue.1, pp.135-152, 1981.
DOI : 10.1016/0039-6028(81)90363-0

J. M. Buriak, M. P. Stewart, T. W. Geders, M. J. Allen, H. C. Choi et al., Lewis Acid Mediated Hydrosilylation on Porous Silicon Surfaces, Journal of the American Chemical Society, vol.121, issue.49, pp.121-11491, 1999.
DOI : 10.1021/ja992188w

A. Poghossian, M. H. Abouzar, M. Sakkari, T. Kassab, Y. Han et al., Field-effect sensors for monitoring the layer-by-layer adsorption of charged macromolecules, Sensors and Actuators B: Chemical, vol.118, issue.1-2, pp.163-170, 2006.
DOI : 10.1016/j.snb.2006.04.013

T. Bocking, E. L. Wong, M. James, J. A. Watson, C. L. Brown et al., Immobilization of dendrimers on Si-C linked carboxylic acid-terminated monolayers on silicon(111) Thin Solid Films, pp.515-1857, 2006.

F. Wei, B. Sun, Y. Guo, and X. S. Zhao, Monitoring DNA hybridization on alkyl modified silicon surface through capacitance measurement, Biosensors and Bioelectronics, vol.18, issue.9, pp.1157-1163, 1993.
DOI : 10.1016/S0956-5663(03)00002-2

M. R. Linford, P. Fenter, P. M. Eisenberger, C. , and C. E. , Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated Silicon, Journal of the American Chemical Society, vol.117, issue.11, pp.117-3145, 1995.
DOI : 10.1021/ja00116a019

A. B. Sieval, V. Vleeming, H. Zuilhof, and E. J. Sudholter, An Improved Method for the Preparation of Organic Monolayers of 1-Alkenes on Hydrogen-Terminated Silicon Surfaces, Langmuir, vol.15, issue.23, pp.15-8288, 1999.
DOI : 10.1021/la9904962

R. L. Cicero, M. R. Linford, C. , and C. E. , Photoreactivity of Unsaturated Compounds with Hydrogen-Terminated Silicon(111), Langmuir, vol.16, issue.13, pp.16-5688, 2000.
DOI : 10.1021/la9911990

F. Effenberger, G. Götz, B. Bidlingmaier, M. Wezstein, R. Linke et al., Photoactivated Preparation and Patterning of Self-Assembled Monolayers with 1-Alkenes and Aldehydes on Silicon Hydride Surfaces, High-Quality Alkyl Monolayers on Silicon Surfaces. Advanced Materials, pp.12-1457, 1998.
DOI : 10.1002/(SICI)1521-3773(19981002)37:18<2462::AID-ANIE2462>3.0.CO;2-R

A. Fidélis, F. Ozanam, and J. Chazalviel, Fully methylated, atomically flat (111) silicon surface, Surface Science, vol.444, issue.1-3, pp.1-3, 2000.
DOI : 10.1016/S0039-6028(99)01065-1

A. Faucheux, Nouvelles fonctionnalités de l'interface silicium/ diélectrique pour la microélectronique, Thèse (Ecole Polytechnique), 2005.

C. Douarche, Etude de l'adsorption de l'ADN simple brin et double brin aux interfaces, Thèse (Ecole Polytechnique), 2007.

A. Faucheux, A. Gouget-laemmel, C. Henry-de-villeneuve, R. Boukherroub, F. Ozanam et al., Well-Defined Carboxyl-Terminated Alkyl Monolayers Grafted onto H-Si(111): Packing Density from a Sum-Frequency Spectroscopy of Surfactants Adsorbed at a Flat Hydrophobic Surface, Combined AFM and Quantitative IR Study. Langmuir Journal of Physical Chemistry, vol.22, issue.5434, pp.153-162, 1994.

K. Taga, I. Shimizu, H. Fukui, T. K. Jain, and H. Okabayashi, Vibrational analysis of 3-chloropropylsilane, Vibrational Spectroscopy, vol.14, issue.2, pp.229-237, 1997.
DOI : 10.1016/S0924-2031(97)00009-X

J. R. Durig, C. Pan, and G. A. Guirgis, Spectra and structure of silicon containing compounds. XXXII. Raman and infrared spectra, conformational stability, vibrational assignment and ab initio calculations of n-propylsilane-d0 and Si-d3, Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy, vol.59, issue.5, pp.59-979, 2003.
DOI : 10.1016/S1386-1425(02)00263-9

G. A. Guirgis, Y. E. Nashed, J. Tao, D. L. Powell, A. Gruodis et al., Spectra and structure of silicon containing compounds. XXXI. Raman and infrared spectra, conformational stability, ab initio calculations, and vibrational assignment of ethyl bromosilane and ethyl bromosilane-Si-d2, Journal of Molecular Structure, vol.641, issue.2-3, pp.125-146, 2002.
DOI : 10.1016/S0022-2860(02)00170-9

T. A. Mohamed, G. A. Guirgis, Y. E. Nashed, and J. R. Durig, Spectra and Structures of Silicon-Containing Compounds. Raman and Infrared Spectra, r 0 Structural Parameters, Vibrational Assignment, Barriers to Internal Rotation, and Ab Initio Calculations of Ethylsilane, Structural Chemistry, issue.94, pp.255-264, 1998.

X. Wallart, C. Henry-de-villeneuve, A. , and P. , Truly Quantitative XPS Characterization of Organic Monolayers on Silicon: Study of Alkyl and Alkoxy Monolayers on H???Si(111), Journal of the American Chemical Society, vol.127, issue.21, pp.127-7871, 2005.
DOI : 10.1021/ja0430797
URL : https://hal.archives-ouvertes.fr/hal-00125385

M. Perring, S. Dutta, S. Arafat, M. Mitchell, P. J. Kenis et al., Simple Methods for the Direct Assembly, Functionalization, and Patterning of Acid-Terminated Monolayers on Si(111), Langmuir, vol.21, issue.23, pp.21-10537, 2005.
DOI : 10.1021/la051369a

R. D. Rohde, H. D. Agnew, W. S. Yeo, R. C. Bailey, and J. R. Heath, A Non-Oxidative Approach toward Chemically and Electrochemically Functionalizing Si(111), Thermal decomposition of alkyl monolayers covalently grafted on (111) silicon. Applied Physics Letters, pp.9518-9525, 2006.
DOI : 10.1021/ja062012b
URL : http://www.ncbi.nlm.nih.gov/pmc/articles/PMC3695602

L. Segev, A. Salomon, A. Natan, D. Cahen, L. Kronik et al., Electronic structure of Si(111)-bound alkyl monolayers: Theory and experiment, Electronic Structure of Methoxy-, Bromo-, and Nitrobenzene Grafted onto Si, pp.74-110, 2006.
DOI : 10.1103/PhysRevB.74.165323

J. T. Chazalviel, M. James, H. G. Coster, T. C. Chilcott, and K. D. Barrow, Coulomb Screening by Mobile Charges: Applications to Materials Science Structural Characterization of Organic Multilayers on Silicon(111) Formed by Immobilization of Molecular Films on Functionalized Si-C Linked Monolayers, Birkhäuser. 67. Bocking, pp.20-9227, 1999.
DOI : 10.1007/978-1-4612-1762-6

A. Moraillon, A. Gouget-laemmel, F. Ozanam, and J. Chazalviel, Amidation of Monolayers on Silicon in Physiological Buffers:??? A Quantitative IR Study, The Journal of Physical Chemistry C, vol.112, issue.18, pp.112-7158, 2008.
DOI : 10.1021/jp7119922

Z. Lin, T. Strother, W. Cai, X. Cao, L. M. Smith et al., DNA Attachment and Hybridization at the Silicon (100) Surface, Langmuir, vol.18, issue.3, pp.18-788, 2002.
DOI : 10.1021/la010892w

S. R. Holmes-farley, R. H. Reamey, T. J. Mccarthy, J. Deutch, and G. M. Whitesides, Acid-base behavior of carboxylic acid groups covalently attached at the surface of polyethylene: The usefulness of contact angle in following the ionization of surface functionality, Langmuir, vol.1, issue.6, pp.725-740, 1985.
DOI : 10.1021/la00066a016

E. B. Troughton, C. D. Bain, G. M. Whitesides, R. G. Nuzzo, D. L. Allara et al., Monolayer films prepared by the spontaneous self-assembly of symmetrical and unsymmetrical dialkyl sulfides from solution onto gold substrates: structure, properties, and reactivity of constituent functional groups, Langmuir, vol.4, issue.2, pp.365-385, 1988.
DOI : 10.1021/la00080a021

C. D. Bain and G. M. Whitesides, A study by contact angle of the acid-base behavior of monolayers containing .omega.-mercaptocarboxylic acids adsorbed on gold: an example of reactive spreading, Langmuir, vol.5, issue.6, pp.1370-1378, 1989.
DOI : 10.1021/la00090a019

S. R. Wasserman, Y. T. Tao, and G. M. Whitesides, Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substrates, Langmuir, vol.5, issue.4, pp.1074-1087, 1989.
DOI : 10.1021/la00088a035

Y. J. Liu, N. M. Navasero, Y. , and H. Z. , Structure and Reactivity of Mixed Carboxy/ Alkyl Monolayers on Silicon: ATR-FTIR Spectroscopy and Contact Angle Titration, Langmuir, issue.10, pp.20-4039, 2004.

J. Zhao, L. Luo, X. Yang, E. Wang, D. et al., Determination of Surface pK a of SAM Using an Electrochemical Titration Method, Electroanalysis, issue.1115, pp.1108-1113, 1999.

D. Vezenov, A. Noy, L. F. Rozsnyai, and C. M. Lieber, Force Titrations and Ionization State Sensitive Imaging of Functional Groups in Aqueous Solutions by Chemical Force Microscopy, Journal of the American Chemical Society, vol.119, issue.8, pp.119-2006, 1997.
DOI : 10.1021/ja963375m

K. Hu and A. J. Bard, Use of Atomic Force Microscopy for the Study of Surface Acid???Base Properties of Carboxylic Acid-Terminated Self-Assembled Monolayers, Langmuir, vol.13, issue.19, pp.13-5114, 1997.
DOI : 10.1021/la9700782

T. Kakiuchi, M. Iida, S. I. Imabayashi, N. , K. Creager et al., Double-Layer-Capacitance Titration of Self-Assembled Monolayers of Functionalized Alkanethiols on Au(111) Surface Contact-Angle Titrations of Mixed .omega.- Mercaptoalkanoic Acid/Alkanethiol Monolayers on Gold Reactive vs Nonreactive Spreading, and Chain Length Effects on Surface pKa Values Determination of the Surface pK of Carboxylic-and Amine-Terminated Alkanethiols Using Surface Plasmon Resonance Spectroscopy Nano-ordered topographical effects on dissociation of carboxylic acid terminated self-assembled monolayers adsorbed onto a gold surface, Langmuir Langmuir Langmuir Journal of Electroanalytical Chemistry, vol.16, issue.812, pp.5397-5401, 1994.

S. S. Cheng, D. A. Scherson, and C. N. Sukenik, In Situ Attenuated Total Reflectance Fourier Transform Infrared Spectroscopy Study of Carboxylate-Bearing, Siloxane-Anchored, Self-Assembled Monolayers: A Study of Carboxylate Reactivity and Acid-Base Properties, Langmuir, vol.11, issue.4, pp.1190-1195, 1995.
DOI : 10.1021/la00004a026

O. Gershevitz and C. N. Sukenik, In Situ FTIR-ATR Analysis and Titration of Carboxylic Acid-Terminated SAMs, Journal of the American Chemical Society, vol.126, issue.2, pp.482-483, 2004.
DOI : 10.1021/ja037610u

O. Gershevitz, A. Osnis, and C. N. Sukenik, Interfacial chemistry on carboxylate-functionalized monolayer assemblies, Israel Journal of Chemistry, vol.108, issue.7, pp.321-336, 2005.
DOI : 10.1560/98PR-AJY7-7JLE-63YQ

P. Allongue, V. Costa-kieling, and H. Gerischer, Etching of Silicon in NaOH Solutions, Journal of The Electrochemical Society, vol.140, issue.4, pp.1009-1018, 1993.
DOI : 10.1149/1.2056189

P. Gorostiza, C. Henry-de-villeneuve, Q. Y. Sun, F. Sanz, X. Wallart et al., Water Exclusion at the Nanometer Scale Provides Long-Term Passivation of Silicon (111) Grafted with Alkyl Monolayers, The Journal of Physical Chemistry B, vol.110, issue.11, pp.110-5576, 2006.
DOI : 10.1021/jp054825c
URL : https://hal.archives-ouvertes.fr/hal-00127062

J. R. Kanicky and D. O. Shah, Effect of Degree, Type, and Position of Unsaturation on the pKa of Long-Chain Fatty Acids, Journal of Colloid and Interface Science, vol.256, issue.1, pp.201-207, 2002.
DOI : 10.1006/jcis.2001.8009

J. R. Kanicky, D. O. Shah, J. O. Bockris, A. K. Reddy, M. Fedurco et al., Effect of Premicellar Aggregation on the pK a of Fatty Acid Soap Solutions Double Layer Effects at Molecular Films Containing Acid/Base Groups, Langmuir Modern Electrochemistry. Langmuir, vol.19, issue.2 77, pp.2034-2038, 1970.

V. Molinero, E. J. Calvo, R. Schweiss, P. B. Welzel, C. Werner et al., Electrostatic interactions at self assembled molecular films of charged thiols on gold, Journal of Electroanalytical Chemistry, vol.445, issue.1-2, pp.17-25, 1998.
DOI : 10.1016/S0022-0728(97)00510-X

W. P. Gomes, F. Cardon, P. E. Laibinis, R. G. Nuzzo, and G. M. Whitesides, Electron energy levels in semiconductor electrochemistry Structure of monolayers formed by coadsorption of two n-alkanethiols of different chain lengths on gold and its relation to wetting Characterization of w;- Functionalized Undecanethiol Mixed Self-Assembled Monolayers on Au(111): A Combined Polarization Modulation Infrared Reflection-Absorption Spectroscopy/Xray Photoelectron Spectroscopy/Periodic Density Functional Theory Study, Progress in Surface Science Journal of Physical Chemistry Journal of Physical Chemistry C, vol.12, issue.1121, pp.155-215, 1982.

R. Boukherroub and D. D. Wayner, Controlled Functionalization and Multistep Chemical Manipulation of Covalently Modified Si(111) Surfaces, Journal of the American Chemical Society, issue.49, pp.121-11513, 1999.

G. D. Mahan and A. A. Lucas, Collective vibrational modes of adsorbed CO, The Journal of Chemical Physics, vol.68, issue.4, pp.1344-1348, 1978.
DOI : 10.1063/1.435952

A. Crossley and D. A. King, Infrared spectra for co isotopes chemisorbed on Pt ???111???: Evidence for strong absorbate coupling interactions, Surface Science, vol.68, pp.528-538, 1977.
DOI : 10.1016/0039-6028(77)90245-X

R. M. Hammaker, S. A. Francis, and R. P. Eischens, Infrared study of intermolecular interactions for carbon monoxide chemisorbed on platinum. Spectrochimica Acta, pp.1295-1309, 1965.

S. C. Chang, L. W. Leung, and M. J. Weaver, Comparisons between Coverage- Dependent Infrared Frequencies for Carbon-Monoxide Adsorbed on Ordered Pt Pt(100), and Pt(110) in Electrochemical and Ultrahigh-Vacuum Environments, Journal of Physical Chemistry, issue.11114, pp.93-5341, 1989.

T. Strother, W. Cai, X. Zhao, R. J. Hamers, and L. M. Smith, Synthesis and Characterization of DNA-Modified Silicon (111) Surfaces, Journal of the American Chemical Society, vol.122, issue.6, pp.122-1205, 2000.
DOI : 10.1021/ja9936161

R. Voicu, R. Boukherroub, V. Bartzoka, T. Ward, J. T. Wojtyk et al., Formation, Characterization, and Chemistry of Undecanoic Acid-Terminated Silicon Surfaces:?? Patterning and Immobilization of DNA, Langmuir, vol.20, issue.26, pp.20-11713, 2004.
DOI : 10.1021/la047886v

K. Uosaki, M. E. Quayum, S. Nihonyanagi, and T. Kondo, Decomposition Processes of an Organic Monolayer Formed on Si(111) via a SiliconCarbon Bond Induced by Exposure to UV Irradiation or Ozone, Langmuir, vol.20, issue.4, pp.1207-1212, 2004.
DOI : 10.1021/la030211s

M. R. Davidson, S. A. Mitchell, and R. H. Bradley, Surface studies of low molecular weight photolysis products from UV-ozone oxidised polystyrene, Surface Science, vol.581, issue.2-3, pp.169-177, 2005.
DOI : 10.1016/j.susc.2005.02.049

Q. Yu, Y. J. Kim, M. , and H. , Plasma treatment of diamond nanoparticles for dispersion improvement in water, Applied Physics Letters, vol.88, issue.23, pp.88-231503, 2006.
DOI : 10.1063/1.2208279

V. Bruser, M. Heintze, W. Brandl, G. Marginean, and H. Bubert, Surface modification of carbon nanofibres in low temperature plasmas, Diamond and Related Materials, vol.13, issue.4-8, pp.4-8, 2004.
DOI : 10.1016/j.diamond.2003.10.061

V. Chirila, G. Marginean, and W. Brandl, Effect of the oxygen plasma treatment parameters on the carbon nanotubes surface properties, Surface and Coatings Technology, vol.200, issue.1-4, pp.1-4, 2005.
DOI : 10.1016/j.surfcoat.2005.01.089

Y. J. Hwang, S. Matthews, M. Mccord, and M. Bourham, Surface Modification of Organic Polymer Films Treated in Atmospheric Plasmas, Journal of The Electrochemical Society, vol.151, issue.7, pp.151-495, 2004.
DOI : 10.1149/1.1756891

N. Médard, J. C. Soutif, and F. Poncin-epaillard, Characterization of CO2 plasma-treated polyethylene surface bearing carboxylic groups, Surface and Coatings Technology, vol.160, issue.2-3, pp.197-205, 2002.
DOI : 10.1016/S0257-8972(02)00407-3

N. Médard, J. C. Soutif, and F. Poncin-epaillard, O Plasma Chemistry for Polyethylene Surface Modification, Langmuir, vol.18, issue.6, pp.2246-2253, 2002.
DOI : 10.1021/la011481i

M. Lehocky, H. Drnovska, B. Lapci-'kova, A. M. Barros-timmons, T. Trindade et al., Plasma surface modification of polyethylene, Colloids and Surfaces A: Physicochemical and Engineering Aspects, vol.222, issue.1-3, pp.1-3, 2003.
DOI : 10.1016/S0927-7757(03)00242-5

S. Guruvenket, G. M. Rao, M. Komath, and A. M. Raichur, Plasma surface modification of polystyrene and polyethylene, Applied Surface Science, vol.236, issue.1-4, pp.1-4, 2004.
DOI : 10.1016/j.apsusc.2004.04.033
URL : http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.615.1661

D. Geyter, N. Morent, R. Leys, and C. , Surface characterization of plasma-modified polyethylene by contact angle experiments and ATR-FTIR spectroscopy, Surface and Interface Analysis, vol.46, issue.3-4, pp.40-43, 2008.
DOI : 10.1002/sia.2611

R. Morent, N. De-geyter, C. Leys, L. Gengernbre, and E. Payen, Comparison between XPS- and FTIR-analysis of plasma-treated polypropylene film surfaces, Surface and Interface Analysis, vol.36, issue.3-4, pp.40-43, 2008.
DOI : 10.1002/sia.2619
URL : https://hal.archives-ouvertes.fr/hal-00338739

M. Tatoulian, F. Arefi-khonsari, N. Shahidzadeh-ahmadi, and J. Amouroux, Comparison of the efficiency of N 2 and NH 3 plasma treatments to improve the adhesion of PP films to in situ deposited Al coatings. Study of ageing phenomena in terms of acid-base properties, International Journal of Adhesion and Adhesives, issue.3, pp.15-177, 1995.

R. M. France and R. D. Short, Plasma Treatment of Polymers:?? The Effects of Energy Transfer from an Argon Plasma on the Surface Chemistry of Polystyrene, and Polypropylene. A High-Energy Resolution X-ray Photoelectron Spectroscopy Study, Langmuir, vol.14, issue.17, pp.14-4827, 1998.
DOI : 10.1021/la9713053

F. Arefi-khonsari, J. Kurdi, M. Tatoulian, and J. Amouroux, On plasma processing of polymers and the stability of the surface properties for enhanced adhesion to metals, Surface and Coatings Technology, vol.142, issue.144, pp.142-144, 2001.
DOI : 10.1016/S0257-8972(01)01240-3

F. Huang, Q. Wei, X. Wang, and W. Xu, Dynamic contact angles and morphology of PP fibres treated with plasma, Polymer Testing, vol.25, issue.1, pp.22-27, 2006.
DOI : 10.1016/j.polymertesting.2005.09.017

J. Raacke, M. Giza, and G. Grundmeier, Combination of FTIR reflection absorption spectroscopy and work function measurement for in-situ studies of plasma modification of polymer and metal surfaces, Surface and Coatings Technology, vol.200, issue.1-4, pp.1-4, 2005.
DOI : 10.1016/j.surfcoat.2005.02.014

F. M. Elms and G. A. George, Plasma reactions of self-assembled monolayers to model oxygen atom effects on polymers. Polymers for Advanced Technologies, pp.31-37, 1998.

F. Arefi-khonsari, M. Tatoulian, F. Bretagnol, O. Bouloussa, R. et al., Processing of polymers by plasma technologies, Surface and Coatings Technology, vol.200, issue.1-4, pp.1-4, 2005.
DOI : 10.1016/j.surfcoat.2005.02.184

W. E. Unger, A. Lippitz, T. Gross, J. F. Friedrich, C. Woll et al., The Use of Octadecyltrichlorosilane Self-Assembled Layers as a Model for the Assessment of Plasma Treatment and Metallization Effects on Polyolefins, Langmuir, vol.15, issue.4, pp.1161-1166, 1999.
DOI : 10.1021/la981174l

N. Delorme, J. Bardeau, A. Bulou, and F. Poncin-epaillard, Controlled modification of octadecyltrichlorosilane self-assembled monolayer by CO2 plasma, Thin Solid Films, vol.496, issue.2, pp.612-618, 2006.
DOI : 10.1016/j.tsf.2005.09.105

C. Y. Xue and K. L. Yang, Chemical Modifications of Inert Organic Monolayers with Oxygen Plasma for Biosensor Applications, Langmuir, vol.23, issue.10, pp.5831-5835, 2007.
DOI : 10.1021/la070076+

J. Chazalviel, C. Da-fonseca, and F. Ozanam, In Situ Infrared Study of the Oscillating Anodic Dissolution of Silicon in Fluoride Electrolytes, Journal of The Electrochemical Society, vol.145, issue.3, pp.145-964, 1998.
DOI : 10.1149/1.1838373

C. Da-fonseca, F. Ozanam, and J. Chazalviel, In situ infrared characterisation of the interfacial oxide during the anodic dissolution of a silicon electrode in fluoride electrolytes, Surface Science, vol.365, issue.1, pp.1-14, 1996.
DOI : 10.1016/0039-6028(96)80111-7

S. Miyazaki, H. Nishimura, M. Fukuda, L. Ley, and J. And-ristein, Structure and electronic states of ultrathin SiO 2 thermally grown on Si(100) and Si(111) surfaces, Applied Surface Science, pp.113-114, 1997.

F. Ozanam and J. Chazalviel, In-situ infrared vibrational study of the early stages of silicon oxidation at the interface with a non-aqueous electrolyte, Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, vol.269, issue.2, pp.251-266, 1989.
DOI : 10.1016/0022-0728(89)85136-8

F. M. Elms and G. A. , Plasma reactions of self-assembled monolayers to model oxygen atom effects on polymers. Polymers for Advanced Technologies, pp.31-37, 1998.

F. Normand, A. Granier, P. Leprince, J. Marec, M. K. Shi et al., Polymer treatment in the flowing afterglow of an oxygen microwave discharge: Active species profile concentrations and kinetics of the functionalization, Plasma Chemistry and Plasma Processing, vol.46, issue.D6, pp.15-173, 1995.
DOI : 10.1007/BF01459695

D. Lin-vien, N. B. Colthup, W. G. Fateley, J. Grasselli, and G. , Handbook of Infrared and Raman Characteristic Frequencies of Organic Molecules, 0257.

Z. Zhou, D. Du, and A. Fu, Structures and vibrational frequencies of pyruvic acid: density functional theory study, Vibrational Spectroscopy, vol.23, issue.2, pp.181-186, 2000.
DOI : 10.1016/S0924-2031(00)00061-8

I. D. Reva, S. G. Stepanian, L. Adamowicz, F. , and R. , Combined FTIR Matrix Isolation and Ab Initio Studies of Pyruvic Acid:?? Proof for Existence of the Second Conformer, The Journal of Physical Chemistry A, vol.105, issue.19, pp.105-4773, 2001.
DOI : 10.1021/jp0101458

G. Roberson, M. Roberto, J. Verboncoeur, and P. Verdonck, Global model simulations of low-pressure oxygen discharges, Brazilian Journal of Physics, vol.37, issue.2a, pp.457-465, 2007.
DOI : 10.1590/S0103-97332007000300019

G. R. Misium, Macroscopic Modeling of Oxygen Plasmas Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films, pp.1642-1647, 1990.

C. Lee, D. B. Graves, M. A. Lieberman, and D. W. Hess, Global Model of Plasma Chemistry in a High Density Oxygen Discharge, Journal of The Electrochemical Society, vol.141, issue.6, pp.141-1546, 1994.
DOI : 10.1149/1.2054960

M. Shibata, N. Nakano, and T. Makabe, Effect of O 2 ( 1 ? g ) on plasma structures in oxygen radio frequency discharges, Journal of Applied Physics, issue.11, pp.80-6142, 1996.

W. Morscheidt, K. Hassouni, N. Bauduin, F. Arefi-khonsari, and J. Amouroux, On the Use of Global Kinetics Models for the Investigation of Energy Deposition and Chemistry in RF Argon?Oxygen Plasmas Working in the Torr Regime, Plasma Chemistry and Plasma Processing, vol.23, issue.1, pp.117-140, 2003.
DOI : 10.1023/A:1022472904111

W. Morscheidt, Modélisation d'un réacteur RF à couplage capacitif en mélange Ar- O 2 dans les conditions utilisées pour le procédé de dépôt par voie plasma d'oxyde d'étain, Thèse, 2002.

W. Morscheidt, K. Hassouni, F. Arefi-khonsari, and J. Amouroux, Modelling and experimental study of an O2/Ar/tetramethyltin discharge used for the deposition of transparent conductive thin tin oxide films, Thin Solid Films, vol.427, issue.1-2, pp.219-224, 2003.
DOI : 10.1016/S0040-6090(02)01215-4

S. Tang and H. S. Choi, Comparison of Low- and Atmospheric-Pressure Radio Frequency Plasma Treatments on the Surface Modification of Poly(methyl methacrylate) Plates, The Journal of Physical Chemistry C, vol.112, issue.12, pp.112-4712, 2008.
DOI : 10.1021/jp711238k

P. Patino, F. E. Hernandez, and S. And-rondon, Reactions of O(3P) with secondary C-H bonds of saturated hydrocarbons in nonequilibrium plasmas, Plasma Chemistry and Plasma Processing, vol.18, issue.2, pp.159-171, 1995.
DOI : 10.1007/BF01459694

T. Belmonte, C. D. Pintassilgo, T. Czerwiec, G. Henrion, V. Hody et al., Oxygen plasma surface interaction in treatments of polyolefines, Surface and Coatings Technology, vol.200, issue.1-4, pp.1-4, 2005.
DOI : 10.1016/j.surfcoat.2005.02.108
URL : https://hal.archives-ouvertes.fr/hal-00123426

J. March, Advanced Organic Chemistry (Reactions, Mechanisms and Structure) 4th Edition, p.705, 1992.

B. J. Larson, J. M. Helgren, S. O. Manolache, A. Y. Lau, M. G. Lagally et al., Cold-plasma modification of oxide surfaces for covalent biomolecule attachment, Biosensors and Bioelectronics, vol.21, issue.5, pp.796-801, 2005.
DOI : 10.1016/j.bios.2005.02.005

A. Holländer, J. Thome, M. Keusgen, I. Degener, and W. Klein, Polymer surface chemistry for biologically active materials, Applied Surface Science, vol.235, issue.1-2, pp.145-150, 2004.
DOI : 10.1016/j.apsusc.2004.05.132

C. Oehr, M. Müller, B. Elkin, D. Hegemann, and U. Vohrer, Plasma grafting ??? a method to obtain monofunctional surfaces, Surface and Coatings Technology, vol.116, issue.119, pp.116-119, 1999.
DOI : 10.1016/S0257-8972(99)00201-7

S. Swaraj, U. Oran, A. Lippitz, J. F. Friedrich, and W. E. Unger, Study of influence of external plasma parameters on plasma polymerised films prepared from organic molecules (acrylic acid, allyl alcohol, allyl amine) using XPS and NEXAFS, Surface and Coatings Technology, vol.200, issue.1-4, pp.1-4, 2005.
DOI : 10.1016/j.surfcoat.2005.01.083

D. Aureau, F. Ozanam, P. Allongue, and J. N. Chazalviel, The Titration of Carboxyl-Terminated Monolayers Revisited: In Situ Calibrated Fourier Transform Infrared Study of Well-Defined Monolayers on Silicon, Langmuir, vol.24, issue.17, pp.24-9440, 2008.
DOI : 10.1021/la801219u