On the Electro-Chemical Polarity of Gases, Philosophical Transactions of the Royal Society of London, vol.142, issue.0, p.87 ,
DOI : 10.1098/rstl.1852.0008
Foundations of Vacuum Technology, pp.2-18, 2003. ,
1858: Observations on the electrical discharge through rarefied gases, The London, Edinburgh and Dublin Philosophical Magazine, p.409 ,
On a Fourth State of Matter, Proceedings of the Royal Society of London, vol.30, issue.200-205, p.469 ,
DOI : 10.1098/rspl.1879.0147
On Electrical Evaporation, Scientific American, vol.32, issue.811supp, p.12958 ,
DOI : 10.1038/scientificamerican07181891-12958supp
1877: On the production of transparent metallic films by electrical discharge in exhausted tubes, Am. J. Sci. Arts, vol.12, p.49 ,
Filtered vacuum arc deposition of semiconductor thin films, IEEE Transactions on Plasma Science, vol.23, issue.6, p.939, 1995. ,
DOI : 10.1109/27.476479
Early history of vacuum arc deposition, IEEE Transactions on Plasma Science, vol.29, issue.5, p.759, 2001. ,
DOI : 10.1109/27.964470
1894: Art of plating one material on another ,
1892: Process of duplicating phonograms, p.582 ,
Process of coating phonograph records, 1902. ,
Note on the production of mirrors by cathodic bombardment, in On the Making of Reflecting Surfaces, p. 26, the Imperial College of Science and Technology, 1920. ,
The nature of physical sputtering, in Handbook of Thin Film Technology, Eds. Maissel L.I, issue.3, pp.1-35, 1970. ,
Rays of Positive Electricity and Their Application to Chemical Analyses, pp.172-175, 1913. ,
Coating by cathode disintegration, p.146025, 1939. ,
Sputter deposition processes, in Handbook Of Deposition Technologies For Films And Coatings, pp.275-337, 1994. ,
Sputtered thin film coatings, in Coatings Technology Handbook, ch. 30, pp.1-10, 2006. ,
Sputtering and sputter deposition, in Handbook of Thin- Film Deposition Processes And Techniques 2 nd Edition, pp.319-348, 2002. ,
Principles of Physical Vapor Deposition of Thin Films, pp.552-618, 2006. ,
Handbook of Physical Vapor Deposition (PVD) Processing, pp.343-609, 1998. ,
Mass spectroscopy of sputtered neutrals and its application for surface analysis, Surface Science, vol.44, issue.2, p.480, 1974. ,
DOI : 10.1016/0039-6028(74)90132-0
On the energy distribution of sputtered dimers, Radiation Effects, vol.21, issue.4, p.269, 1974. ,
DOI : 10.1103/PhysRev.99.430
On the energy distribution of sputtered clusters, Radiation Effects, vol.26, issue.1-2, p.23, 1975. ,
DOI : 10.1016/0031-8914(71)90129-7
1974: A Study of the neutral species rf sputtered from oxide targets Japn, J. Appl. Phys, issue.2, p.501 ,
Mass???Spectrometric Study of Sputtering of Single Crystals of GaAs by Low???Energy A Ions, Journal of Applied Physics, vol.38, issue.7, p.2956, 1967. ,
DOI : 10.1063/1.1710031
The sputtering of gallium arsenide at elevated temperatures, Applied Physics, vol.26, issue.3, p.207, 1979. ,
DOI : 10.1007/BF00886019
Early days of magnetron sputtering, Thin Solid Films, p.99, 1989. ,
Sputtering of Dielectrics by High???Frequency Fields, Journal of Applied Physics, vol.33, issue.10, p.2991, 1962. ,
DOI : 10.1063/1.1728549
Method and apparatus for cleansing by ionic bombardment, p.137, 1966. ,
Sputtering by ion bombardment, Advances in Electronics and Electron Physics, p.239, 1955. ,
The Materials Science of Thin Films, pp.109-132, 1992. ,
Ion plating, in Handbook Of Deposition Technologies For Films And Coatings, pp.346-391, 1994. ,
1962: Growth of solid layers on substrates which are kept under ion bombardment before and during deposition, p.21271 ,
Film deposition using accelerated ions, Electrochem. Technol, vol.2, p.295, 1964. ,
Apparatus for coating a cathodically biased substrate from plasma of ionized coating material, p.601, 1966. ,
Ionized physical vapor deposition (IPVD): A review of technology and applications, Thin Solid Films, p.1, 2006. ,
Recent developments in plasma assisted physical vapour deposition, Journal of Physics D: Applied Physics, vol.33, issue.18, p.173, 2000. ,
DOI : 10.1088/0022-3727/33/18/201
Color in Films of Sputtered Tin, Journal of the Optical Society of America, vol.23, issue.3, p.109, 1933. ,
DOI : 10.1364/JOSA.23.000109
The microstructure of sputter???deposited coatings, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.4, issue.6, p.3059, 1986. ,
DOI : 10.1116/1.573628
Nucletion, film growth, and microstructural evolution, in Handbook Of Deposition Technologies For Films And Coatings, pp.707-760, 1994. ,
Physics of Film Growth from the Vapor Phase, in Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals, and Devices, pp.39-86, 1993. ,
Study of the structure and properties of thick vacuum condensates of nickel, titanium, tungsten, aluminium oxide and zirconium dioxide, Phys. Met. Metallogr, vol.28, p.83, 1969. ,
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings, Journal of Vacuum Science and Technology, vol.11, issue.4, 1974. ,
DOI : 10.1116/1.1312732
Microstructural evolution during film growth, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.21, issue.5, p.117, 2003. ,
DOI : 10.1116/1.1601610
Revised structure zone model for thin film physical structure, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.2, issue.2, p.500, 1984. ,
DOI : 10.1116/1.572604
Columnar microstructure in vapor-deposited thin films, Thin Solid Films, vol.47, issue.3, p.219, 1977. ,
DOI : 10.1016/0040-6090(77)90037-2
Dependence of thin???film microstructure on deposition rate by means of a computer simulation, Journal of Applied Physics, vol.58, issue.7, p.2573, 1985. ,
DOI : 10.1063/1.335885
Atomistic processes in the early stages of thinfilm growth, Science, pp.276-377, 1997. ,
Structure Modification by Ion Bombardment during Deposition, Journal of Vacuum Science and Technology, vol.9, issue.1, p.528, 1972. ,
DOI : 10.1116/1.1316677
Ion-beam-induced epitaxial vapor-phase growth: A molecular-dynamics study, Physical Review B, vol.35, issue.15, p.7906, 1987. ,
DOI : 10.1103/PhysRevB.35.7906
Modelling ion-assisted deposition of CeO 2 films, Appl. Phys. A, pp.40-209, 1986. ,
Boron carbide???A comprehensive review, Journal of the European Ceramic Society, vol.6, issue.4, p.205, 1990. ,
DOI : 10.1016/0955-2219(90)90048-K
Investigation of structure and mechanical properties of magnetron sputtered monolayer and multilayer coatings in the ternary system Si???B???C, Surface and Coatings Technology, vol.201, issue.9-11, p.5564, 2007. ,
DOI : 10.1016/j.surfcoat.2006.07.130
Preparation of boron carbide thin films for HDD protecting layer, Journal of Magnetism and Magnetic Materials, vol.272, issue.276, pp.272-276, 2004. ,
DOI : 10.1016/j.jmmm.2003.12.918
Effect of ion bombardment on the properties of B4C thin films deposited by RF sputtering, Thin Solid Films, vol.355, issue.356, pp.355-356, 1999. ,
DOI : 10.1016/S0040-6090(99)00506-4
Boron carbide and boron carbonitride thin films as protective coatings in ultra-high density hard disk drives, Surface and Coatings Technology, vol.200, issue.12-13, p.4072, 0200. ,
DOI : 10.1016/j.surfcoat.2005.02.164
Chemical vapor deposition of boron carbide, Materials Science and Engineering: B, vol.79, issue.3, p.191, 2001. ,
DOI : 10.1016/S0921-5107(00)00538-9
Tribology of naturally occurring boric acid films on boron carbide, Surface and Coatings Technology, vol.86, issue.87, pp.86-87, 1996. ,
DOI : 10.1016/S0257-8972(96)02984-2
Influence of carbon content on the crystallographic structure of boron carbide films, Surface and Coatings Technology, vol.125, issue.1-3, p.141, 2000. ,
DOI : 10.1016/S0257-8972(99)00594-0
Abrasion and chemical???mechanical polishing between steel and a sputtered boron carbide coating, Wear, vol.252, issue.1-2, pp.252-161, 2002. ,
DOI : 10.1016/S0043-1648(01)00868-7
Improving tribological properties of sputtered boron carbide coatings by process modifications, Surface and Coatings Technology, vol.126, issue.1, p.69, 2000. ,
DOI : 10.1016/S0257-8972(00)00525-9
Thermoelectric properties of crystallized boron carbide thin films prepared by ion-beam evaporation, Thin Solid Films, vol.407, issue.1-2, p.132, 2002. ,
DOI : 10.1016/S0040-6090(02)00026-3
Sputter deposition of high resistivity boron carbide, Thin Solid Films, vol.335, issue.1-2, p.174, 1998. ,
DOI : 10.1016/S0040-6090(98)00876-1
Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process, Thin Solid Films, vol.407, issue.1-2, p.126, 2002. ,
DOI : 10.1016/S0040-6090(02)00025-1
Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering, Diamond and Related Materials, vol.8, issue.2-5, p.402, 1999. ,
DOI : 10.1016/S0925-9635(98)00274-X
Synthesis and characterization of single and multilayer boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide, Thin Solid Films, pp.414-129, 2002. ,
Coating composition and method, p.715, 1987. ,
Multilayer coating including disordered, wear resistant boron carbon external coating, p.294, 1984. ,
Molding tool and method, p.590031, 1986. ,
Microhardness study of amorphous hydrogenated boron carbide deposited on a cathode substrate by plasma deposition, Applied Physics Letters, vol.69, issue.16, p.2373, 1996. ,
DOI : 10.1063/1.117641
Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films, Thin Solid Films, vol.312, issue.1-2, pp.312-147, 1998. ,
DOI : 10.1016/S0040-6090(97)00735-9
Chemical composition of boron carbonitride films grown by plasma-enhanced chemical vapor deposition from trimethylamineborane, Inorganic Materials, vol.39, issue.4, p.366, 2003. ,
DOI : 10.1023/A:1023227716045
Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes, Journal of Applied Physics, vol.72, issue.10, p.4925, 1992. ,
DOI : 10.1063/1.352060
Deposition of boron carbide thin film by supersonic plasma jet CVD with secondary discharge, Surface and Coatings Technology, vol.108, issue.109, pp.108-109, 1998. ,
DOI : 10.1016/S0257-8972(98)00661-6
Boron carbide thin film deposition using supersonic plasma jet with substrate biasing, Diamond and Related Materials, vol.8, issue.10, p.1878, 1999. ,
DOI : 10.1016/S0925-9635(99)00147-8
Deposition of boron carbide by laser CVD: a comparison with thermodynamic predictions, Thin Solid Films, vol.307, issue.1-2, p.29, 1997. ,
DOI : 10.1016/S0040-6090(97)00298-8
Boron carbide coatings prepared by cathodic arc deposition, Journal of Materials Science, vol.38, issue.14, p.3117, 2003. ,
DOI : 10.1023/A:1024729330748
Preparation of polycrystalline boron carbide thin films at room temperature by pulsed ion-beam evaporation, Applied Physics Letters, vol.80, issue.7, p.1153, 2002. ,
DOI : 10.1063/1.1449539
Ion beam synthesis of boron carbide thin films, Surface and Coatings Technology, vol.158, issue.159, pp.158-159, 2002. ,
DOI : 10.1016/S0257-8972(02)00248-7
Effect of laser fluence on the deposition and hardness of boron carbide thin films, Appl. Phys. A, pp.74-533, 2002. ,
Chemical Structure and Micro-Mechanical Properties of Ultra-Thin Films of Boron Carbide Prepared by Pulsed-Laser Deposition, Tribology Letters, vol.17, issue.1, p.99, 2004. ,
DOI : 10.1023/B:TRIL.0000017424.92978.66
Young's modulus and residual stress of plasma-sprayed boron carbide coatings, Journal of the European Ceramic Society, vol.21, issue.1, p.87, 2001. ,
DOI : 10.1016/S0955-2219(00)00169-2
Evaluation of vacuum plasma-sprayed boron carbide protection for the stainless steel, Journal of Nuclear Materials, pp.329-333, 2004. ,
Formation of boron carbide coating by electromagnetically accelerated plasma spraying, Surface and Coatings Technology, vol.169, issue.170, pp.169-170, 2003. ,
DOI : 10.1016/S0257-8972(03)00128-2
Microstructure and mechanical properties of B4C films deposited by ion beam sputtering, Thin Solid Films, vol.516, issue.2-4, p.336, 2007. ,
DOI : 10.1016/j.tsf.2007.06.030
Structures and properties of disordered boron carbide coatings generated by magnetron sputtering, Thin Solid Films, vol.332, issue.1-2, p.80, 1998. ,
DOI : 10.1016/S0040-6090(98)01019-0
Sputter-deposited boron carbide films: Structural and mechanical characterization, Surface and Coatings Technology, vol.200, issue.5-6, pp.5-6, 2005. ,
DOI : 10.1016/j.surfcoat.2005.08.031
Processproperty relationship of boron carbide thin films by magnetron sputtering, Thin Solid Films, p.120, 2003. ,
Tribological behavior of sputtered boron carbide coatings and the influence of processing gas, Wear, vol.259, issue.7-12, pp.259-807, 2005. ,
DOI : 10.1016/j.wear.2005.02.096
Handbook of Refractory Carbides and Nitrides, pp.118-154, 1996. ,
Processing of Boron Carbide, 2006. ,
Properties of RF sputtered B 4 C thin films, Nucl. Instrum. Meth. Phys. Res. B, vol.91, pp.1-4, 1994. ,
Microstructure and mechanical properties of boron carbide thin films, Materials Letters, vol.57, issue.4, p.899, 2002. ,
DOI : 10.1016/S0167-577X(02)00892-3
Mechanical properties and structure of amorphous and crystalline B4C films, Diamond and Related Materials, p.27, 2009. ,
DOI : 10.1016/j.diamond.2008.07.021
Synthesis of boron carbide films by ion beam sputtering, Surface and Coatings Technology, vol.128, issue.129, pp.128-129, 2000. ,
DOI : 10.1016/S0257-8972(00)00599-5
Preparation of boron carbide thin films from reactive sputtering of boron, physica status solidi (b), vol.332, issue.7, p.1637, 2004. ,
DOI : 10.1002/pssb.200304574
Sputtering yield formula for B4C irradiated with monoenergetic ions at normal incidence, Journal of Nuclear Materials, vol.232, issue.1, p.52, 1996. ,
DOI : 10.1016/0022-3115(96)00393-5
Diagnostics of sputtering processes of carbon and carbides by laser-induced fluorescence spectroscopy in the VUV at 166 nm, Applied Physics A Solids and Surfaces, vol.8, issue.147, p.61, 1992. ,
DOI : 10.1007/BF00348132
Calculation of bulk moduli of diamond and zinc-blende solids, Physical Review B, vol.32, issue.12, p.7988, 1985. ,
DOI : 10.1103/PhysRevB.32.7988
Predicting properties and new materials, Solid State Comm, p.45, 1994. ,
Structural properties of d.c. magnetron sputtered B???C???N thin films and correlation to their mechanical properties: a new empirical formula, Thin Solid Films, vol.467, issue.1-2, p.66, 2004. ,
DOI : 10.1016/j.tsf.2004.03.008
Magnetron-sputtered superhard materials, Surface and Coatings Technology, vol.97, issue.1-3, p.45, 1997. ,
DOI : 10.1016/S0257-8972(97)00159-X
Subplantation effect in magnetron sputtered superhard boron carbide thin films, Diamond and Related Materials, vol.7, issue.6, p.835, 1998. ,
DOI : 10.1016/S0925-9635(97)00306-3
Effects of relative humidity on tribological properties of boron carbide coating against steel, Surf, p.4230, 2006. ,
Superhard PVD coatings in the B???N???C triangle, International Journal of Refractory Metals and Hard Materials, vol.17, issue.1-3, p.157, 1999. ,
DOI : 10.1016/S0263-4368(98)00066-3
Tribological properties of B???C thin films deposited by magnetron-sputter-ion plating method, Surface and Coatings Technology, vol.91, issue.3, p.167, 1997. ,
DOI : 10.1016/S0257-8972(96)03105-2
The role of trapped Ar atoms in the mechanical properties of boron carbide films deposited by dc-magnetron sputtering, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.21, issue.5, p.1639, 2003. ,
DOI : 10.1116/1.1593054
Self-replenishing solid lubricant films on boron carbide, Surface Engineering, vol.47, issue.4, p.291, 1999. ,
DOI : 10.1016/0257-8972(90)90003-U
Tribofilm formation on boron carbide in sliding wear, Wear, vol.236, issue.1-2, pp.236-73, 1999. ,
DOI : 10.1016/S0043-1648(99)00266-5
Micromechanical and microtribological properties of BCN thin films near the B4C composition deposited by r.f. magnetron sputtering, Diamond and Related Materials, vol.10, issue.9-10, p.1892, 2001. ,
DOI : 10.1016/S0925-9635(01)00429-0
Boron carbide films deposited by a magnetron sputter???ion plating process: film composition and tribological properties, Diamond and Related Materials, vol.9, issue.3-6, p.489, 2000. ,
DOI : 10.1016/S0925-9635(99)00318-0
Wear behavior of B4C???Mo co-sputtered wear coatings, Surface and Coatings Technology, vol.141, issue.1, p.48, 2001. ,
DOI : 10.1016/S0257-8972(01)01122-7
Rolling-contact fatigue and wear resistance of hard coatings on bearing-steel substrates, Surf. Coat. Technol, pp.54-55, 1992. ,
Surface feature variations observed in 52100 steel sliding against a thin boron carbide coating, Wear, vol.249, issue.10-11, pp.249-1004, 2002. ,
DOI : 10.1016/S0043-1648(01)00840-7
Effects of Contact on the Abrasiveness of a Thin Boron Carbide Coating, Tribology Letters, vol.295, issue.1, p.21, 2005. ,
DOI : 10.1007/s11249-005-7789-x
X-ray photoelectron spectroscopy investigation of boron carbide films deposited by sputtering, Surface Science, vol.572, issue.2-3, p.418 ,
DOI : 10.1016/j.susc.2004.09.020
Thermoelectric properties of boron-carbide thin film and thin film based thermoelectric device fabricated by intense-pulsed ion beam evaporation, Science and Technology of Advanced Materials, vol.5, issue.2, p.181, 2005. ,
DOI : 10.1016/0022-5088(76)90089-8
Sputter deposition of high resistivity boron carbide, Thin Solid Films, vol.335, issue.1-2, p.174, 1998. ,
DOI : 10.1016/S0040-6090(98)00876-1
C) thin films fabricated by plasma???enhanced chemical???vapor deposition, Journal of Applied Physics, vol.79, issue.11, p.8643, 1996. ,
DOI : 10.1063/1.362487
Nitrogen incorporation into boron carbide thin films deposited by DC-magnetron sputtering: Film microstructure and tribological properties, Surf. Coat. Technol, pp.142-144, 2001. ,
DOI : 10.1016/s0257-8972(01)01213-0
Boron Carbide and Boron-Carbon Nitride Films Deposited by DC-Magnetron Sputtering: Structural Characterization and Nanotribological Properties, physica status solidi (a), vol.68, issue.119, p.1, 2001. ,
DOI : 10.1002/1521-396X(200109)187:1<1::AID-PSSA1>3.0.CO;2-O
Synthesis and properties of boron carbon nitride (BN:C) films by pulsed-DC magnetron sputtering, Materials Chemistry and Physics, vol.72, issue.2, p.264, 2001. ,
DOI : 10.1016/S0254-0584(01)00449-7
Mechanical properties of thin films in the ternary triangle B???C???N, Surface and Coatings Technology, vol.163, issue.164, pp.163-164, 2003. ,
DOI : 10.1016/S0257-8972(02)00489-9
BCN thin films near the B4C composition deposited by radio frequency magnetron sputtering, Diamond and Related Materials, vol.9, issue.3-6, p.502, 2000. ,
DOI : 10.1016/S0925-9635(99)00319-2
Deposition of c-BN films by DC magnetron sputtering, Diamond and Related Materials, vol.7, issue.1, p.26, 1998. ,
DOI : 10.1016/S0925-9635(97)00150-7
Deposition of carbon-containing cubic boron nitride films by pulsed- DC magnetron sputtering, Thin Solid Films, pp.398-399, 2001. ,
The constitution and properties of cubic boron nitride thin films: a comparative study on the influence of bombarding ion energy, Surface and Coatings Technology, vol.174, issue.175, pp.174-175, 2003. ,
DOI : 10.1016/S0257-8972(03)00533-4
Stres reduction in boron carbonitride films by ion energy-modulated multilayers, Surf. Coat. Tech, pp.116-119, 1999. ,
Structural features of thick c-boron nitride coatings deposited via a graded B???C???N interlayer, Surface and Coatings Technology, vol.142, issue.144, pp.142-144, 2001. ,
DOI : 10.1016/S0257-8972(01)01212-9
Bonding characteristics of DC magnetron sputtered B???C???N thin films investigated by Fourier-transformed infrared spectroscopy and X-ray photoelectron spectroscopy, Thin Solid Films, vol.467, issue.1-2, p.76, 2004. ,
DOI : 10.1016/j.tsf.2004.03.009
FGM research programs in Japan ? from structural to functional uses, in Functionally Graded Materials, Proceedings of the 4 th International Symposium on Functionally Graded Materials, AIST Tsukuba Research Center, pp.1-9, 1996. ,
Functionally graded diamond-like carbon coatings on metallic substrates, Materials Science and Engineering: A, vol.278, issue.1-2, p.162, 2000. ,
DOI : 10.1016/S0921-5093(99)00569-9
Graded coatings for thermal, wear and corrosion barriers, Materials Science and Engineering: A, vol.362, issue.1-2, p.61, 2003. ,
DOI : 10.1016/S0921-5093(03)00579-3
Functionally graded Co???Cr???Mo coating on Ti???6Al???4V alloy structures, Functionally graded Co?Cr?Mo coating on Ti?6Al?4V alloy structures, p.697, 2008. ,
DOI : 10.1016/j.actbio.2007.10.005
Tribological properties of graded diamond-like carbon films on Ti ion-implanted aluminum substrate, Diamond and Related Materials, vol.17, issue.11, p.1844, 2008. ,
DOI : 10.1016/j.diamond.2007.12.025
Microstructural characterization of Ti?TiN/CN x gradient-multilayered coatings, Surf. Coat. Tech, pp.180-181, 2004. ,
Device for Amplifying the Current of an Abnormal Electrical Discharge and System for Using an Abnormal Electrical Discharge Comprising one Such Device, U.S. Patent Application Publication, pp.26241-26242, 2004. ,
Characterization of thin films and coatings, in Handbook Of Deposition Technologies For Films And Coatings, pp.789-845, 1994. ,
Scanning electron microscopy, Encyclopedia of Materials Characterization, pp.70-84, 1992. ,
Energy-dispersive X-ray spectroscopy, Encyclopedia of Materials Characterization, pp.120-134, 1992. ,
Electron probe X-ray microanalysis, Encyclopedia of Materials Characterization, pp.175-191, 1992. ,
Transmission electron microscopy, Encyclopedia of Materials Characterization, pp.99-115, 1992. ,
Secondary Ion Mass Spectrometry, Basic Concepts, Instrumental Aspects, Applications and Trends, pp.1-6, 1987. ,
Dynamic secondary ion mass spectrometry, Encyclopedia of Materials Characterization, pp.532-548, 1992. ,
Static secondary ion mass spectrometry, Encyclopedia of Materials Characterization, pp.549-558, 1992. ,
Dynamic secondary ion mass spectrometry, in Surface and Thin Film Analysis: Principles, Instrumentation, Application, pp.106-121, 2002. ,
Measurement of Hardness and Young???s Modulus by Nanoindentation, Nanostructured Coating, pp.216-260, 2006. ,
DOI : 10.1007/978-0-387-48756-4_6
Nanomechanical properties of solid surface and thin films, in Handbook of Micro, Nano Tribology, issue.10, pp.1-91, 1999. ,
Vickers Indentation Curves of Magnesium Oxide (MgO), Journal of Tribology, vol.106, issue.1, p.43, 1984. ,
DOI : 10.1115/1.3260865
A method for interpreting the data from depth-sensing indentation instruments, Journal of Materials Research, vol.36, issue.04, p.601 ,
DOI : 10.1016/0020-7225(65)90019-4
An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments, Journal of Materials Research, vol.XI, issue.06, p.1564, 1992. ,
DOI : 10.1557/JMR.1992.0613
On the generality of the relationship among contact stiffness, contact area, and elastic modulus during indentation, Journal of Materials Research, vol.26, issue.03, p.613, 1992. ,
DOI : 10.1016/0020-7683(87)90116-8
Introduction-Measurement techniques and applications, in Handbook of Micro, Nano Tribology, issue.1, pp.1-77, 1999. ,
Friction and wear measurement techniques, in Modern Tribology Handbook, p. 493 Ed, Bharat Bhushan, 2001. ,
Influence de la Microstructure sur le Comportement Tribologique de Depôts Composites Projétés Plasma, pp.37-57, 2007. ,
Nanoindentation and Raman spectroscopy studies of boron carbide single crystals, Applied Physics Letters, vol.81, issue.20, p.3783, 2002. ,
DOI : 10.1063/1.1521580
Raman effect of boron carbide (B4.3C to B10.37C), Journal of Alloys and Compounds, vol.205, issue.1-2, p.87, 1994. ,
DOI : 10.1016/0925-8388(94)90771-4
Transition from amorphous boron carbide to hexagonal boron carbon nitride thin films induced by nitrogen ion assistance, Journal of Applied Physics, vol.92, issue.9, p.5177, 2002. ,
DOI : 10.1063/1.1512317
Characteristics of carbon incorporated BN films deposited by radio frequency PACVD, Surface and Coatings Technology, vol.133, issue.134, pp.133-134, 2000. ,
DOI : 10.1016/S0257-8972(00)00924-5
Synthesis and characterization of boron carbonitride thin films by reactive DC magnetron sputtering, 11 th International Conference and Exhibition of the European Ceramic Society, 2009. ,
Synthesis and Characterization of Boron Carbide Thin Films Grown by RF Sputtering, TMS 2009 138 th Annual Meeting and Exhibition Supplemental Proceedings Vol. I: Fabrication, Materials Processing and Properties, pp.573-580, 2009. ,
A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma?enhanced DC magnetron sputtering, TMS 2008 137 th Annual Meeting and Exhibition Supplemental Proceedings Vol. I: Materials Processing and Properties, pp.9-13, 2008. ,
The effect of controlled ion bombardment on the properties of boron carbide thin films deposited by plasma?enhanced dc magnetron sputtering, Innovations on Thin Films Processing and Characterisation?ITFPC 07, pp.20-23 ,
Characterization of Boron Carbide Thin Films Grown by DC Magnetron Sputtering of a Hot?Pressed Boron Carbide Target, 10 th International Conference and Exhibition of the European Ceramic Society Proceedings CD-Rom, pp.265-270, 2007. ,
URL : https://hal.archives-ouvertes.fr/hal-00319679
Effect of Oxygen Flow Rate and Substrate Temperature on ZnO Thin Film Properties Deposited By Reactive DC Magnetron Sputtering, XIII. International Materials Research Congress, pp.22-26, 2004. ,
Deposition of AlN Thin Films by Reactive DC Magnetron Sputtering: Effect of Bias Voltage and N2 Rate on Optical and Microstructural Properties, XIII. International Materials Research Congress, pp.22-26, 2004. ,
Processing and Characterization of Functionally Graded Ti/TixCy/DLC Thin Film Coatings, th Conference and Exhibition of the European Ceramic Society (ECerS), pp.593-596, 2004. ,
The Characterization of Metal-Ceramic Interfaces in Porcelain Teeth, th Conference and Exhibition of the European Ceramic Society (ECerS), pp.683-686, 2004. ,
DOI : 10.4028/www.scientific.net/KEM.264-268.683
Investigation of Production Parameters and Characterization of Functionally Graded Ti/TixCy/DLC Thin Film Coatings Deposited Using Reactive Magnetron Sputtering/PECVD Hybrid Technique, 11 th International Metallurgy and Materials Congrees, pp.5-08, 2002. ,
Deposition of ZnO Thin Films on Glass Substrates by Using DC Reactive Magnetron Sputtering, 11 th International Metallurgy and Materials Congrees, pp.5-08 ,