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Electrogreffage et photogreffage de couches organiques sur des substrats conducteurs et semi-conducteurs

Abstract : Two different processes for the attachment of the cyanomethyl radical (CH2CN), deriving from acetonitrile, to metallic and semiconducting surfaces are described. The first method is based on an H-abstraction reaction. A specially designed aryl radical can abstract an hydrogen atom from acetonitrile. In the second method, the same cyanomethyl radical is produced by deep UV irradiation of acetonitrile. This radical attaches covalently to the surface and is also responsible for the growth of an amino functionalized layer. The functionalized film is characterized by various methods (IRRAS, ellipsometry, profilometry, contact angle measurements, SEM, EDX, AFM and chemical derivatization). Adsorption as a preliminary step in the grafting of diazonium salts is examined in the last chapter. From corrosion measurements on iron, it is concluded that there is no adsorption step prior to the grafting step.
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https://pastel.archives-ouvertes.fr/pastel-00649488
Contributor : Daniel Swift <>
Submitted on : Thursday, December 8, 2011 - 9:42:01 AM
Last modification on : Saturday, September 26, 2020 - 11:44:07 PM
Long-term archiving on: : Friday, November 16, 2012 - 2:51:02 PM

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  • HAL Id : pastel-00649488, version 1

Citation

Avni Berisha. Electrogreffage et photogreffage de couches organiques sur des substrats conducteurs et semi-conducteurs. Chimie-Physique [physics.chem-ph]. Université Pierre et Marie Curie - Paris VI, 2011. Français. ⟨pastel-00649488⟩

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