H. Lin, T. Jin, A. Dmytruk, M. Saito, and T. Yazawa, Preparation of a porous ITO electrode, Journal of Photochemistry and Photobiology A: Chemistry, vol.164, issue.1-3, pp.1-3, 2004.
DOI : 10.1016/j.jphotochem.2003.12.023

J. G. Lu, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima et al., Zno-based thin films synthesized by atmospheric pressure mist chemical vapor deposition, Journal of Crystal Growth, vol.299, issue.1, pp.1-10, 2007.
DOI : 10.1016/j.jcrysgro.2006.10.251

H. A. Macleod, Thin-Films Optical Filters, Institute of Physics Publishing, 2001.

S. Shanthi, C. Subramanian, and P. Ramasamy, Investigations on the Optical Properties of Undoped, Fluorine Doped and Antimony Doped Tin Oxide Films, Crystal Research and Technology, vol.30, issue.8, pp.1037-1046, 1999.
DOI : 10.1002/(SICI)1521-4079(199909)34:8<1037::AID-CRAT1037>3.0.CO;2-J

C. J. Glassbrenner and G. A. Slack, Thermal Conductivity of Silicon and Germanium from 3??K to the Melting Point, A), pp.1058-1069, 1964.
DOI : 10.1103/PhysRev.134.A1058

E. D. Palik, Handbook of Optical Constants of Solids, 1998.

N. Yoshio, Publications Procédé thermique rapide (RTP : Rapid Thermal Process

P. O. Logerais, D. Chapron, and A. Bouteville, Transient simulations of a Rapid Thermal Processing apparatus, Journal of Optoelectronics and Advanced Materials, vol.9, issue.4, pp.1082-1086, 2007.

P. O. Logerais, M. Girtan, and A. Bouteville, Influence of the quartz window in a Rapid Thermal Processing apparatus, Journal of Optoelectronics and Advanced Materials, vol.8, issue.1, pp.139-143, 2006.

M. Girtan, P. O. Logerais, L. Avril, F. Gonzzatti, and A. Bouteville, Thermal profile evaluation of a silicon wafer in the apparatus for Rapid Thermal Chemical vapour Deposition, Journal of Optoelectronics and Advanced Materials, vol.7, issue.2, pp.665-670, 2005.

M. Girtan, P. O. Logerais, and A. Bouteville, Study on the possibilities of modelling the physical processes involved in spray CVD, pp.181-188, 2005.

M. Girtan, P. O. Logerais, and A. Bouteville, Substrate thermal profiles in spray-CVD reactor, Journal of Optoelectronics and Advanced Materials, vol.8, issue.1, pp.144-147, 2006.