Modélisation du lissage de défauts sur les optiques asphériques de photolithographie : approche par éléments discrets

Abstract : In aspherical photolithography optics manufacturing, the smoothing step iscritical. So far, it is the only process that can correct high spatial frequency defects, responsiblefor flare and transmission, contrast decrease. This operation must preserve the low frequencyaspherical shape while smoothing high frequency defects. That behavior can be obtained withtools that combine a continuous flexible layer for low frequency compliance and a fractionatepitch layer for high frequency defect polishing. The main goals of this study are predicting thesmoothing efficiency and form control of different tools, and then determining the best tool toachieve a good balance between them. To do this, a multi-scale model is developed. First, atthe whole tool scale, a finite-element parametric study yields the best characteristics for theflexible layer as well as the optimal applied force to achieve pressure homogeneity at the globalaspherical shape level. Second, at the pitch layer level, the Discrete Element Method is used toinvestigate the tool-workpiece interface. A model based on the viscoelastic cohesive beamconcept is developed, taking into account the pitch layer’s frequency response. Comparisonwith Dynamic Mechanical Analysis shows the ability of DEM to model viscoelastic behavior. Thesmoothing operation is then modeled both by DEM and analytically. Experimental data obtainedby the Power Spectral Density Method highlight the impact of pitch properties on the smoothingefficiency. Comparison between numerical and experimental data shows that the DEM modelyields promising results in defect smoothing modeling
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Antoine Goupil. Modélisation du lissage de défauts sur les optiques asphériques de photolithographie : approche par éléments discrets. Autre. Ecole nationale supérieure d'arts et métiers - ENSAM, 2013. Français. ⟨NNT : 2013ENAM0023⟩. ⟨pastel-00871688⟩

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