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Conception, réalisation et métrologie de miroirs multicouches pour l'extrême ultraviolet résistants aux environnements du spatial et des sources EUV.

Christophe Hecquet 1
1 Laboratoire Charles Fabry de l'Institut d'Optique / Scop
LCFIO - Laboratoire Charles Fabry de l'Institut d'Optique
Abstract : The Extreme Ultraviolet Spectrum (EUV) wavelengths, which range between 13 nm and 40 nm, have many applications in science and technology. These have been developed for example in plasma physics (high order harmonics sources, X ray lasers), solar astrophysics or EUV photolithography.
The work presented is about the design, the fabrication and the metrology of periodic multilayer mirrors. The main motivation of this study is to establish a cycle of development taking into account both the optical properties of reflective coatings (reflectivity, spectral selectivity, attenuation) and their behaviour under various environments.
To improve the spectral selectivity, new multilayer periodic structures have been developed. They are characterized by a bimodal reflectance profile with adjustable attenuation.
The effect of environment on the stability of performance is especially critical for the optical collection. The addition of material barriers has stabilized the performance of the peak reflectivity for over 200 h at 400°C and it reduces the influence of other factors of instability on the reflectance.
In addition, all structures have been fabricated successfully and evaluated in severe environments.
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Submitted on : Sunday, May 24, 2009 - 2:27:37 PM
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Christophe Hecquet. Conception, réalisation et métrologie de miroirs multicouches pour l'extrême ultraviolet résistants aux environnements du spatial et des sources EUV.. Matière Condensée [cond-mat]. Université Paris Sud - Paris XI, 2009. Français. ⟨tel-00387144⟩

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