Etude numérique et expérimentale de la croissance de couches minces déposées par pulvérisation réactive.

Abstract : The objective of the present work is to determine experimentally the input parameters of the modelling software and then to compare experimental and numerical results in the case of different metals and their oxides. The GLAD configuration was deliberately chosen for the particular angled structures it allows.The Physical Vapor Deposition (PVD) process can be divided in three steps: ejection of atoms from the target, transport to the substrate and growth of the thin films. Different softwares have been developed for each step: SRIM is a computer program that calculates the interactions of energetic ions; SIMTRA simulates the transport of the atoms from the target to the substrate and Simul3D simulates the growth of the film. The evolution of the thin angled films’ properties (column tilt angles β, thickness, residual stress, etc.) versus the orientation of the substrate is studied.The experimental and numerical results complement each other and allow a better understanding of the many aspects of the study.
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Submitted on : Friday, December 16, 2016 - 12:56:05 PM
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Ahcene Siad. Etude numérique et expérimentale de la croissance de couches minces déposées par pulvérisation réactive.. Mécanique des matériaux [physics.class-ph]. Ecole nationale supérieure d'arts et métiers - ENSAM, 2016. Français. ⟨NNT : 2016ENAM0024⟩. ⟨tel-01418118⟩

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